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Beneq Strengthens Its Lead in High-volume Industrial ALD
ESPOO, Finland, July 20, 2016 /PRNewswire/ --
New Beneq R11(TM) and Beneq T2S(TM) products introduced at ALD2016
Beneq, the leading supplier of ALD equipment and thin film coating services, today
announced two new thin film equipment solutions for industrial customers that require high
capacity and low process cost in advanced ALD applications. The new products are set to
revolutionize the standards of coating speed in the ALD industry.Â
Beneq R11(TM) - Ultra-fast high precision spatial ALD coatingÂ
Beneq R11 is the latest addition to Beneq's extensive portfolio of large-throughput
spatial ALD solutions for industrial use. It provides an optimal solution for high
performance ALD on wafers in industrial applications. It is the ideal choice of equipment
when speed, cost, low process temperature and the highest possible film quality are the
driving factors.
With Beneq R11, it is for the first time possible to use PEALD (Plasma Enhanced ALD)
processes in high volume manufacturing. The system lends itself to barrier, insulation and
anti-corrosion applications for MEMS, LED, OLED, photovoltaics, high power semiconductors,
sensors and others.
Beneq T2S(TM) - Automated batch wafer equipmentÂ
Beneq T2S is the newest member of Beneq's wafer-based production equipment portfolio.
It offers a unique combination of high capacity batch processing and standard
cassette-to-cassette automation. The Beneq T2S is specifically engineered to match the
semiconductor requirements, including the SEMI S2 safety requirements and low particle
counts.
Beneq T2S is perfectly suited for high volume manufacturing in various wafer-based
applications, including MEMS, LED, OLED, ink-jet print heads and more. The thermal batch
ALD process of Beneq T2S is ideal for oxide and nitride processes used for dielectric,
conductor, barrier and passivation purposes.
New products officially unveiled in ALD2016 in IrelandÂ
Both new products, Beneq R11 and Beneq T2S, will be introduced officially next week at
ALD2016 - the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland.
Beneq(R) is the leading supplier of ALD equipment and thin film coating services, and
world's premier manufacturer of ALD-based thin film electroluminescent displays.Â
Beneq thin film solutions improve the performance and durability of electronics,
optics and sensitive materials, and protect from humidity, corrosion and tarnishing.Â
Beneq's rugged, transparent and customized Lumineq(R) displays are used in a wide
array of applications in extreme conditions. Fully transparent Lumineq TASEL(R) displays
combine superior reliability with a unique see-through viewing experience.Â
Â
http://www.beneq.comÂ
http://www.beneq.com/beneq-r11.htmlÂ
http://www.beneq.com/beneq-t2s.html
Â
Â
Further information:Â
Matias Impivaara, Head of Marketing and Communications, +358-9-7599-530.
Beneq
Beneq Strengthens Its Lead in High-volume Industrial ALD
ESPOO, Finland, July 20, 2016 /PRNewswire/ --
New Beneq R11(TM) and Beneq T2S(TM) products introduced at ALD2016
Beneq, the leading supplier of ALD equipment and thin film coating services, today
announced two new thin film equipment solutions for industrial customers that require high
capacity and low process cost in advanced ALD applications. The new products are set to
revolutionize the standards of coating speed in the ALD industry.Â
Beneq R11(TM) - Ultra-fast high precision spatial ALD coatingÂ
Beneq R11 is the latest addition to Beneq's extensive portfolio of large-throughput
spatial ALD solutions for industrial use. It provides an optimal solution for high
performance ALD on wafers in industrial applications. It is the ideal choice of equipment
when speed, cost, low process temperature and the highest possible film quality are the
driving factors.
With Beneq R11, it is for the first time possible to use PEALD (Plasma Enhanced ALD)
processes in high volume manufacturing. The system lends itself to barrier, insulation and
anti-corrosion applications for MEMS, LED, OLED, photovoltaics, high power semiconductors,
sensors and others.
Beneq T2S(TM) - Automated batch wafer equipmentÂ
Beneq T2S is the newest member of Beneq's wafer-based production equipment portfolio.
It offers a unique combination of high capacity batch processing and standard
cassette-to-cassette automation. The Beneq T2S is specifically engineered to match the
semiconductor requirements, including the SEMI S2 safety requirements and low particle
counts.
Beneq T2S is perfectly suited for high volume manufacturing in various wafer-based
applications, including MEMS, LED, OLED, ink-jet print heads and more. The thermal batch
ALD process of Beneq T2S is ideal for oxide and nitride processes used for dielectric,
conductor, barrier and passivation purposes.
New products officially unveiled in ALD2016 in IrelandÂ
Both new products, Beneq R11 and Beneq T2S, will be introduced officially next week at
ALD2016 - the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland.
Beneq(R) is the leading supplier of ALD equipment and thin film coating services, and
world's premier manufacturer of ALD-based thin film electroluminescent displays.Â
Beneq thin film solutions improve the performance and durability of electronics,
optics and sensitive materials, and protect from humidity, corrosion and tarnishing.Â
Beneq's rugged, transparent and customized Lumineq(R) displays are used in a wide
array of applications in extreme conditions. Fully transparent Lumineq TASEL(R) displays
combine superior reliability with a unique see-through viewing experience.Â
Â
http://www.beneq.comÂ
http://www.beneq.com/beneq-r11.htmlÂ
http://www.beneq.com/beneq-t2s.html
Â
Â
Further information:Â
Matias Impivaara, Head of Marketing and Communications, +358-9-7599-530.
Beneq